Okmetic silicon wafers

Silicon solutions for advanced technologies

Okmetic’s silicon wafers are tailored to the customers' processes to provide solutions that can improve yield, make processes more efficient and supply a platform for the development of new, advanced applications.

Our understanding of your product, process and technology needs as well as market drivers guarantee that you not only get optimum wafer performance in volume production, but also the confidence to take your own product development even higher.

Okmetic general specification

MEMS-optimized silicon wafers

Okmetic provides a wide range of MEMS sensor-optimized silicon for various leading-edge technologies. Our process and design tailored solutions are the platform for the development of new generation applications and their effective volume production.

Solutions for power, discrete and advanced IC’s

Advanced semiconductor manufacturing demands process-optimized material – Okmetic’s extensive experience in the whole wafer production process, from ingot growing to epitaxial deposition, ensures highly refined solutions.

General specification

Growth method Cz, MCz
Crystal orientation <100>, <111>, <110>
Diameter 100, 125, 150, 200 mm
N type dopants antimony, arsenic, phosphorus, red phosphorus
P type dopants boron
Resistivity <0.0015 up to 1,500 ohm-cm
Backside treatment etched, BSD, polyback, LTO, polished

CONTACT US

Sales and customer support contacts

TECHNOLOGICAL EXPERTISE FOR SALE

Technological expertise is one of the products sold by Okmetic. Technology sales cover both manufacturing technology and crystal sales.

OKMETIC SOI PRODUCT FAMILY

A variety of further developed products:

Okmetic G-SOI - wafer with built-in gettering properties.

Okmetic C-SOI
- wafer with pre-etched cavities.

Okmetic 0.3-SOI
- wafer with the tightest thickness tolerance in the market

INTRODUCING OKMETIC CAP

 Optimized silicon wafer for encapsulating and protecting MEMS structures

- Okmetic Newsletter 1(2009) -