300 mm test and monitor silicon wafers 

Okmetic provides 300 mm test and monitor silicon wafers for advanced semiconductor manufacturing, supporting foundries, OSATs, and IDMs in process development, equipment qualification, and high-volume production control. Our 300 mm test wafer portfolio is produced through qualified manufacturing partners. Okmetic retains full responsibility for supply chain management and wafer quality, ensuring a smooth and reliable order-to-delivery process. 

This model ensures consistent wafer quality, reliable delivery performance, and tailored substrates for lithography, ion implantation, deposition, etch, CMP, and metrology process monitoring. 

Particle control wafers  

Silicon particle control wafers with 0-18 ppma Oi concentration, 0.5-100 Ohm-cm resistivity, GBIR  ≤12 mm​ and SFQR of  ≤0.15 mm. Different particle level targets available. Well suited for diffusion, thin film deposition, etch, wet, and CMP process monitoring. 

Implant control wafers  

Silicon implant control wafers with 0-18 ppma Oi concentration, 8-12 Ohm-cm resistivity (P-Control) and 7-16 Ohm-cm resistivity (N-Control), ≤1 mm GBIR​ and ≤0.15 mm SFQR. Defectivity levels: LLS at 65nm ≤30 ea​ and LLS at 30nm ≤90 ea. Specifically designed for ion implantation process monitoring. 

Super flat wafers  

Super-flat silicon control wafers with 4-18 ppma Oi concentration, 0.5-100 Ohm-cm resistivity, ≤0.5 mm​ GBIR and ≤0.10 mm SFQR. Defectivity levels: LLS at 65 nm ≤30 ea​ and LLS at 30nm ≤90 ea. Specifically designed for lithography process monitoring.  

Mechanical dummy wafers  

Mechanical (dummy) silicon wafers with 0-18 ppma Oi concentration, 0.1-10,000 Ohm-cm resistivity, ≤2 mm GBIR​ and LLS at 200 nm ≤50 ea. Well suited for diffusion, thin film deposition, etch, ion implantation (IMP), and CMP process qualification and equipment conditioning.